Product Overview
Electon Spectroscopy for Chemical Analysis
Electron Spectroscopy for Chemical Analysis (ESCA), also referred to as X-Ray Photoelectron Spectroscopy (XPS), is an analytical method for characterizing the surface chemistry of materials.
Concentration Depth Profiles:
The ability to perform situ argon ion etching provides a means for characterizing the chemical composition as a function of depth in the sample. Ion Etching rate is approximately
10 angstroms per second.
High Resolution Segmented Scans:
Analysis for specific elements allows precise measure of peak binding energy (related to
chemical state) and integrated peak area (related to atomic concentration ). Raw data is corrected for sample charging effects and photoelectric cross section yield.
Survey Scans:
Qualitative Identification of elements present except hydrogen and helium within the outermost 20-30 angstroms.
Analyzed Region: 1/4” Diameter Area, Detection Limits: Few atom percent, Range of Detectable Elements: All except Hydrogen and Helium, Depth of Analysis: 50-100 angstroms
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